PartnerProject Work PackageFormStatusPublication TitleAuthorsYear of PublishingLink/PDF
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedSimilarity-based Brownian Motion Approach for Remaining Useful Life PredictionDima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2021Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedCombining Approaches of Brownian Motion and Similarity Principle to Improve the Remaining Useful Life PredictionDima el Jamal, Mohamed Al-Kharaz, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2021Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedA Comparative Evaluation of Deep Learning Anomaly Detection Techniques on Semiconductor Multivariate Time Series DataPhilip Tchatchoua, Guillaume Graton, Mustapha Ouladsine, Michel Juge2021Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedHealth Indicator for Batch Processes Based on SP-LASSODima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2022Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedLASSO-based Health Indicator Extraction Method for Semiconductor Manufacturing ProcessesDima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2022Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedSemiconductor Multivariate Time-Series Anomaly Classification Based on Machine Learning Ensemble TechniquesSamia Mellah, Youssef Trardi, Guillaume Graton, Bouchra Ananou, El Mostafa El Adel, Mustapha Ouladsine2022
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublished1D ResNet for Fault Detection and Classification on Sensor Data in Semiconductor ManufacturingPhilip Tchatchoua, Guillaume Graton, Mustapha Ouladsine, Julien Muller, Abraham Traore, Michel Juge2022Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedEnsemble Machine Learning Algorithms for Anomaly Detection in Multivariate Time-SeriesYoussef Trardi; Bouchra Ananou; Philip Tchatchoua; Mustapha Ouladsine2022Visit
AVLWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedPrivacy preserving amalgamated machine learning for process controlWilfried Verachtert, Thomas J. Ashby, Imen Chakroun, Roel Wuyts, Sayantan Das, Sandip Halder, Philippe Leray2021Available
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedPredictive virtual processes, metrology and maintenance in power device manufacturing Antonino La Magna (CNR), Ioannis Deretzis (CNR), Umberto Amato (CNR), Daniele Pagano (ST-I), Patrizia Vasquez (ST-I), Anastasiia Doinychko (MENTOR), Andrea Calimera (POLITO), Alex Rosenbaum (MELLANOX), Marius Enachescu (UPB).2022Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedPenalised robust estimators for sparse and high-dimensional linear modelsUmberto Amato, Anestis Antoniadis, Italia De Feis & Irene Gijbels2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedRobust Classification of Intramuscular EMG Signals to Aid the Diagnosis of Neuromuscular DisordersS. Jose, S. T. George, M. S. P. Subathra, V. S. Handiru, P. K. Jeevanandam, U. Amato and E. S. Suviseshamuthu2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedSimulations of the ultra-fast kinetics in Ni-Si-C ternary systems under laser irradiationSalvatore Sanzaro, Corrado Bongiorno, Paolo Badalà, Anna Bassi, Ioannis Deretzis,, Marius Enachescu, Giovanni Franco, Giuseppe Fisicaro, Patrizia Vasquez, Alessandra Alberti and Antonino La Magna2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedInter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealingSalvatore Sanzaro, Corrado Bongiorno, Paolo Badalà, Anna Bassi, Giovanni Franco, Patrizia Vasquez, Alessandra Alberti, Antonino La Magna2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedPROLIFIC: A Fast and Robust Profile-Likelihood-Based Muscle Onset Detection in Electromyogram Using Discrete Fibonacci SearchEaster S. Suviseshamuthu, Didier Allexandre, Umberto Amato, Biancamaria Della Vecchia, Guang H. Yu2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedFlexible, boundary adapted, nonparametric methods for the estimation of univariate piecewise-smooth functionsUmberto Amato, Anestis Antoniadis, Italia De Feis2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedPenalized wavelet estimation and robust denoising for irregular spaced dataU. Amato, A. Antoniadis, I. De Feis, I. Gijbels2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedWavelet-based robust estimation and variable selection in nonparametric additive modelsU. Amato, A. Antoniadis, I. De Feis, I. Gijbels2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedTXRF/GIRXF high precision laboratory setup with high flux monochromatic sources for archeometric applicationsClaudia G. Fatuzzo (CNR), Philipp Hönicke (PTB), Claudia Caliri (CNR), Andreas Karydas (NCSR) and Francesco Paolo Romano (CNR)2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedMultiscale simulations of plasma etching in silicon carbide structuresMarkus Italia (CNR), Ioannis Deretzis (CNR), Silvia Scalese (CNR), A.La Magna (CNR), M.Pirnaci (ST-I), D.Pagano (ST-I), Dario Tenaglia (ST-I), P.Vasquez (ST-I)2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedTXRF/GIRXF high precision laboratory setup with high flux monochromatic sourcesClaudia G. Fatuzzo (CNR), Philipp Hönicke (PTB), Claudia Caliri (CNR), Roberta Ricciari (ST-I), Daniele Pagano (ST-I), Andreas G. Karydas (CNR), Francesco Paolo Romano (CNR)2022Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedTXRF/GIRXF high precision laboratory setup with high flux monochromatic sourceClaudia G. Fatuzzo (CNR), Philipp Hönicke (PTB), Claudia Caliri (CNR), Giulia Privitera (CNR), Roberta Ricciari (ST-I), Daniele Pagano (ST-I), Andreas G. Karydas (CNR), Patrizia Vasquez4(ST-I), Francesco Paolo Romano (CNR)2021Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentation + Peer-reviewed paperPublishedMulti-branch neural network for hybrid metrology improvementPaul Digraci & al.2022Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperSubmittedEfficient rigorous coupled-wave analysis simulation of Mueller matrix ellipsometry of three-dimensional multilayer nanostructuresHoang Lam Pham & al.2022Available
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedOn the Fly Ellipsometry Imaging for Process Deviation DetectionThomas Alcaire & al.2022Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedNew Industry 4.0 metrology approaches
driven by predictive in line control requirements :

At the frontier between academic studies and industrial world
Bernard Pelissier & al. , SEMI SUBMIT, February 2021, online event2021Available
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedRaman spectroscopy and ellipsometry hybridization: application to GeSbTe crystallization measurement for in line controlJon De Vecchy & al. , ECASIA 2022, Limerick Ireland2021Available
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedHybridisation of ellipsometry and XPS energy loss : robust bandgap and broadband optical constants determination of thin filmsThéo Levert & al. , JNSPE 2022 , Dijon France2021Available
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedGo faster for process control : Enhanced sensitivity of ellipsometry imaging for deviation detectionJean Hervé Tortai & al. , SEMICON Europa 2021, Munich Germany2021Available
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentation + Peer-reviewed paperPublishedData fusion by artificial neural network for hybrid metrology developmentLucien Penlap & al.2021Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperSubmittedHybridization of ellipsometry and XPS energy loss: robust band gap and broadband optical constants determination of SiGe, HfON and MoOx thin filmsTheo Levert & al. ,2021
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentation + Peer-reviewed paperPublishedDetection and correlation of yield loss induced by color resist deposition deviation with a deep learning approach applied to optical acquisitionsThomas Alcaire & al.2021Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentation + Peer-reviewed paperPublishedSpectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning ApproachThomas Alcaire & al2020Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedHybridization of ellipsometry and energy loss spectra from XPS for bandgap and optical constants determination in SiON thin filmsJoao Resende & al2020Visit
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedA hybrid feature selection approach for virtual metrology: Application to CMP processT.KorabiI,V.Borodin, M. Juge, A.Roussy2021ASMC 2021 IEEE
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedOn feature selection for virtual metrologyO.Djedidi,V.Borodin, M. Juge, A.Roussy2021IEEE CASE 2021
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedVirtual metrology for semiconductor manufacturing: Focus on transfer learningR.Clain,V.Borodin, M. Juge, A.Roussy2021APCM 2021
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedVirtual Metrology: a state of the art reviewR.Clain,V.Borodin, M. Juge, A.Roussy2021IEEE CASE 2021
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationSubmittedFeature Selection for Virtual Metrology Modeling:An application to Chemical Mechanical PolishingO.Djedidi, R.Clain, V.Borodin, A.Roussy2022ASMC 2022
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationSubmittedOn Updating a Virtual Metrology Model in Semiconductor Manufacturing via Transfer LearningR.Clain, I. Azzizi, V.Borodin, A.Roussy2022ASMC 2022
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationSubmittedDistance analysis in support of transfer Learning for Virtual MetrolgyR.Clain, V.Borodin, A.Roussy2022ENBIS 2022
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperSubmittedAn Interpretable Unsupervised Bayesian Network Model for Fault Detection and DiagnosisWT.Yang, M.Reis, V.Borodin, A.Roussy2022control engineering practice
Ippon InnovationWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedChasing Abnormalities on Time Series for Predictive Maintenance and Advanced Process ControlC. Girou, F. Bergeret, D. Pagano, P. Vasquez, G. Prinzivalli, G. Tochino2022Visit
Nearfield InstrumentsWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedHigh-NA EUV photoresist metrology using high-throughput scanning probe microscopyM. Mucientes, A. Khachaturiants, R. Trussell, A. Kalinin, Y. Guo, E. C. Simons, S. Kim, O. Nadyarnykh, A. Moussa, J. Bogdanowicz, J. Severi, G. Lorusso, D. De Simone, A.-L. Charley, P. Leray, M. E. van Reijzen, C. Bozdog, H. Sadeghian2022Visit
OCTO TECHNOLOGYWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedDimensionality reduction to improve search time and memory footprint in content-retrieval tasks: application to semiconductor inspection imagesThomas Vial, Farah Dhouib, Louison Roger, Annabelle Blangero, Frédéric Duvivier, Karim Sayadi, Marisa N. Faraggi2022Visit
PTBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedGrazing incidence-x-ray fluorescence for a dimensional and compositional characterization of well-ordered 2D and 3D nanostructuresPhilipp Hönicke, Anna Andrle, Yves Kayser, Konstantin V Nikolaev, Jürgen Probst, Frank Scholze, Victor Soltwisch, Thomas Weimann, Burkhard Beckhoff2020Available
PTBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedAnalysis of Line-Edge Roughness Using EUV ScatterometryA. Fernandez Herrero, F. Scholze, G. Dai, V. Soltwisch
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityOther publicationPublishedNi-silicide ohmic contacts on 4H-SiC formed by multi pulse excimer laser annealingP. Badalà, I. Deretzis, S. Sanzaro, C. Bongiorno, G. Fisicaro, S. Rascunà, G. Bellocchi, A. Bassi, M. Boscaglia, D. Pagano, P: Vasquez, M. Enachescu, A. Alberti, A. La Magna2022Visit
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedAutomatic Defect Detection in Epitaxial Layers by Micro Photoluminescence ImagingJacopo Frascaroli*, Isabella Mica*, Marta Tonini*, Selene Colombo*, Luisito Livellara*
Roberto Fumagalli^, Viktor Samu^, Máté Nagy^, Gábor Molnár^, Áron Horváth^, Zoltán Bartal^, Zoltán Kiss^, Tamás Sipőcz^
2022Visit
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedChasing Abnormalities on Time Series for Predictive Maintenance and Advanced Process ControlC. Girou, F. Bergeret, D. Pagano, P. Vasquez, G. Prinzivalli, G. Tochino2022Visit
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivitySubmitted
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedStructural and electrical characterization of Ni-based ohmic contacts on 4H-SiC formed by solid-state laser annealingPaolo Badalà (ST-I), Emanuele Smecca (CNR), Simone Rascunà (ST-I), Corrado Bongiorno (CNR), Egidio Carria (ST-I), Anna Bassi (ST-I), Gabriele Bellocchi (ST-I), Cristina Tringali (ST-I), Antonino La Magna (CNR) and Alessandra Alberti (CNR)2021Visit
TNOWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedMFIG – a Mass Filtered Ion GaugeHerman Bekman, Thomas Mechielsen, Dorus Elstgeest, Jurjen Emmelkamp, YouyouWestland, Freek Molkenboer, Norbert Koster, Henk Lensen2022Available
TU DelftWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedClosed-loop
active object recognition with constrained illumination power
Oleg Soloviev,Jacques Noom, Michel Verhaegen2022Closed-loop
active object recognition with constrained illumination power
TU DelftWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedIncrease
of wafer inspection tool throughput with computational imaging
Oleg Soloviev, Hieu Thao Nguyen, Jacques Noom, Michel Verhaegen2022Increase
of wafer inspection tool throughput with computational imaging
TU DelftWP3 - Metrology platforms developments for enhanced productivityConference presentationPlannedSubpixel image reconstruction using nonuniform defocused imagesNguyen Hieu Thao, Oleg Soloviev, Jacques Noom, Michel Verhaegen2021Visit
TU DelftWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedHow innovations in methodology offer new prospects for volume electron microscopyA.J. Kievits, R. Lane, E. C. Carroll, J. P. Hoogenboom2022Visit
TU DelftWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedConvex combination of alternating projection and Douglas–Rachford operators for phase retrievalNguyen Hieu Thao, Oleg Soloviev, Michel Verhaegen2021Visit
TU DelftWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedProjection methods for high numerical aperture phase retrievalNguyen Hieu Thao, Oleg Soloviev, Russell Luke, Michel Verhaegen2021Visit
TU DelftWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedParticle detection using closed-loop active model diagnosisJacques Noom, Oleg Soloviev, Carlas Smith, Hieu Thao Nguyen, Michel Verhaegen2022Visit
TU DelftWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedClosed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.Noom, J., Thao, N.H., Soloviev, O., Verhaegen, M.2021Visit
TU DelftWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedPhase retrieval from overexposed PSF: a projection-based approachOleg Soloviev, Jacques Noom, Hieu Thao Nguyen, Gleb Vdovin, and Michel Verhaegen2022Visit
TU/eWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedPredictive discarding of wafers based on power leakage predictions from single layer misalignment dataGeert van Kollenburg, Mike Holenderski, Patrizia Vasquez, Nirvana Meratnia2022Visit
TU/eWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedValue proposition of predictive discarding in semiconductor manufacturingGeert van Kollenburg, Mike Holenderski, Nirvana Meratnia2022Visit
PTBWP3 - Metrology platforms developments for enhanced productivityOther publicationPlannedFlexible correction of 3D non-linear drift in AFM measurements by data fusionJohannes Degenhardt, Rainer Tutsch, Gaoliang Dai  2020Available
TNOWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityOther publicationSubmittedModelling Ion Production inside an Electron Impact Ionizer for High-Vacuum Gas AnalysisJurjen Emmelkamp, Freek Molkenboer, Herman Bekman, Jeroen van den Brink, Dagmar Wismeijer, Norbert Koster, Olaf Kievit, Henk Lensen2020Available
UPBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedPulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition TemperatureC.C. Moise, L. Rachmani, G.V. Mihai, O.A. Lazar, M. Enachescu, N. Naveh2021Visit
UPBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedSurface Topography of Si/TiO2 Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser AblationC.C. Moise, A. Pantazi, G.V. Mihai, A. Jderu, M. Bercu, A.A. Messina, M. Enachescu2021Visit
UPBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedElectrodeposition of NiSn-rGO Composite Coatings from Deep Eutectic Solvents and Their Physicochemical CharacterizationS.P. Rosoiu, A.G. Pantazi, A. Petica, A. Cojocaru, S. Costovici, C. Zanella, T. Visan, L. Anicai and M. Enachescu2020Visit
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedVirtual Metrology to Eliminate Test Wafers Measurements on Copper Electroplating DepositionA. Doinychko, U. Amato, S. Raitsyn, S. Perna, F. Blundo, C. Genua, D. Vinciguerra, A. La Magna, A. Torres, A. Rosenbaum, M.-R. Amini, and P. Vasquez2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedTXRF/GIXRF high precision laboratory setup with high flux monochromatic sourceClaudia G. Fatuzzo, Philipp Hönicke, Claudia Caliri, Roberta Ricciari, Daniele Pagano, Andreas G. Karydas, Patrizia Vasquez, Francesco Paolo Romano2021Visit
MENTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedA fusion of electronic design, process and metrology in semiconductor manufacturing for improved process optimization and controlAnastasiia Doinychko, Andres Torres, Ivan Kissiov, Melody Tao, Sanghyun Choi (Mentor - S-EDA)2022Visit
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityOther publicationPublishedIndustry4.0 Productivity Improvement in Major EU FabsD. Pagano (ST-I)2022Visit
TU/eWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPlannedPredictive discarding for sustainable Industry 5.0Geert van Kollenburg (TU/e), Mike Holenderski (TU/e), Nirvana Meratnia (TU/e), Daniele Pagano (ST-I), Patrizia Vasquez (ST-I)2022Visit