Lead PartnerProject Work PackageFormStatusPublication TitleAuthorsYear of PublishingLink/PDF
AVLWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedPrivacy preserving amalgamated machine learning for process controlWilfried Verachtert, Thomas J. Ashby, Imen Chakroun, Roel Wuyts, Sayantan Das, Sandip Halder, Philippe Leray2021Visit
TUDIndustry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedSubpixel image reconstruction using nonuniform defocused imagesNguyen Hieu Thao, Oleg Soloviev, Jacques Noom, Michel Verhaegen2021Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedNew Industry 4.0 metrology approaches
driven by predictive in line control requirements : At the frontier between academic studies and industrial world
B. Pelissier & al. ,SEMI SUBMIT, February 2021, online event2021Available upon request
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityConference presentationPublishedGo faster for process control : Enhanced sensitivity of ellipsometry imaging for deviation detectionJ.H. Tortai & al. , SEMICON Europa 2021, Munich2021Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedData fusion by artificial neural network for hybrid metrology developmentL.Penlap et al.2021Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperSubmittedHybridization of ellipsometry and XPS energy loss: robust band gap and broadband optical constants determination of SiGe, HfON and MoOx thin filmsTheo Levert & al. ,2021Available upon request
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedDetection and correlation of yield loss induced by color resist deposition deviation with a deep learning approach applied to optical acquisitionsT. Alcaire & al.2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedVirtual Metrology to Eliminate Test Wafers Measurements on Copper Electroplating DepositionSubmited at Materials Chemistry and Physics2021Available upon request
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedTXRF/GIXRF high precision laboratory setup with high flux monochromatic sourcesC. G. Fatuzzo, P. Hönicke, C. Caliri, A. G. Karydas and F. P. Romano2021Available upon request
Convex combination of alternating projection and Douglas-Rachford operators for phase retrievalHieu Thao Nguyen, Oleg Soloviev and Michel Verhaegen2021Visit
PTBWP3 - Metrology platforms developments for enhanced productivityOther publicationPublishedIdentifying the type of line edge roughness using grazing-incidence X-ray fluorescenceZanyar Salami, Analia Fernandez Herrero, Anna Andrle, Philipp Honicke, and Victor Soltwisch2021Visit
PTBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedShape- and element-sensitive reconstruction of periodic nanostructures with grazingincidence X-ray fluorescence analysis and machine learningAnna Andrle, Philipp Hönicke, Grzegorz Gwalt, Philipp-Immanuel Schneider, Yves Kayser, Frank Siewert, Victor Soltwisch2021Visit
PTBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedDimensional and compositional reconstruction of ordered nanostructuresPhilipp Hönicke, Yves Kayser, Konstantin V. Nikolaev, Victor Soltwisch, Jeroen E. Scheerder, Claudia Fleischmann, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Jeffrey Davis, Martin Huth, Anabela Veloso, Roger Loo, Dieter Skroblin, Michael Steinert, Andreas Undisz, Markus Rettenmayr, Burkhard Beckhoff2021Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedPenalised robust estimators for sparse and high-dimensional linear modelsUmberto Amato, Anestis Antoniadis, Italia De Feis & Irene Gijbels2020Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedSpectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning ApproachThomas Alcaire & al2020Visit
CNRS LTMWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedHybridization of ellipsometry and energy loss spectra from XPS for bandgap and optical constants determination in SiON thin filmsJoao Resende & al2020Visit
WP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedFlexible correction of 3D non-linear drift in AFM measurements by data fusionJohannes Degenhardt, Rainer Tutsch, Gaoliang Dai  2020Available upon request
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedRobust Classification of Intramuscular EMG Signals to Aid the Diagnosis of Neuromuscular DisordersS. Jose, S. T. George, M. S. P. Subathra, V. S. Handiru, P. K. Jeevanandam, U. Amato and E. S. Suviseshamuthu2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedSimulations of the ultra-fast kinetics in Ni-Si-C ternary systems under laser irradiationSalvatore Sanzaro, Corrado Bongiorno, Paolo Badalà, Anna Bassi, Ioannis Deretzis,, Marius Enachescu, Giovanni Franco, Giuseppe Fisicaro, Patrizia Vasquez, Alessandra Alberti and Antonino La Magna2020Visit
PTBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedGrazing incidence-x-ray fluorescence for a dimensional and compositional characterization of well-ordered 2D and 3D nanostructuresPhilipp Hönicke, Anna Andrle, Yves Kayser, Konstantin V Nikolaev, Jürgen Probst, Frank Scholze, Victor Soltwisch, Thomas Weimann, Burkhard Beckhoff2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedInter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealingSalvatore Sanzaro, Corrado Bongiorno, Paolo Badalà, Anna Bassi, Giovanni Franco, Patrizia Vasquez, Alessandra Alberti, Antonino La Magna2020Visit
Modelling Ion Production inside an Electron Impact Ionizer for High-Vacuum Gas AnalysisJurjen Emmelkamp, Freek Molkenboer, Herman Bekman, Jeroen van den Brink, Dagmar Wismeijer, Norbert Koster, Olaf Kievit, Henk Lensen2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedPROLIFIC: A Fast and Robust Profile-Likelihood-Based Muscle Onset Detection in Electromyogram Using Discrete Fibonacci SearchEaster S. Suviseshamuthu, Didier Allexandre, Umberto Amato, Biancamaria Della Vecchia, Guang H. Yu2020Visit
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedFlexible, boundary adapted, nonparametric methods for the estimation of univariate piecewise-smooth functionsUmberto Amato, Anestis Antoniadis, Italia De Feis2020Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedSimilarity-based Brownian Motion Approach for Remaining Useful Life PredictionDima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2021Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedCombining Approaches of Brownian Motion and Similarity Principle to Improve the Remaining Useful Life PredictionDima el Jamal, Mohamed Al-Kharaz, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2021Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedA Comparative Evaluation of Deep Learning Anomaly Detection Techniques on Semiconductor Multivariate Time Series DataPhilip Tchatchoua, Guillaume Graton, Mustapha Ouladsine, Michel Juge2021Visit
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedHealth Indicator for Batch Processes Based on SP-LASSODima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2022Available upon request
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedLASSO-based Health Indicator Extraction Method for Semiconductor Manufacturing ProcessesDima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton2022Available upon request
TU/eWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedPredictive discarding of wafers based on power leakage predictions from single layer misalignment dataGeert van Kollenburg, Mike Holenderski, Patrizia Vasquez, Nirvana Meratnia2022Visit
TU/eWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperSubmittedValue proposition of predictive discarding in semiconductor manufacturingGeert van Kollenburg, Mike Holenderski, Nirvana Meratnia2022Visit
OCTO TECHNOLOGYWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperSubmittedDimensionality reduction to improve search time and memory footprint in content-retrieval tasks: application to semiconductor inspection imagesThomas Vial, Farah Dhouib, Louison Roger, Annabelle Blangero, Frédéric Duvivier, Karim Sayadi, Marisa N. Faraggi2022Available upon request
AMUWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperPublishedSemiconductor Multivariate Time-Series Anomaly Classification Based on Machine Learning Ensemble TechniquesSamia Mellah, Youssef Trardi, Guillaume Graton, Bouchra Ananou, El Mostafa El Adel, Mustapha Ouladsine2022Available upon request
Ippon InnovationWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedChasing Abnormalities on Time Series for Predictive Maintenance and Advanced Process ControlC. Girou, F. Bergeret, D. Pagano, P. Vasquez, G. Prinzivalli, G. Tochino2022Download PDF
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedPenalized wavelet estimation and robust denoising for irregular spaced dataU. Amato, A. Antoniadis, I. De Feis, I. Gijbels2021Download PDF
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperPublishedWavelet-based robust estimation and variable selection in nonparametric additive modelsU. Amato, A. Antoniadis, I. De Feis, I. Gijbels2022Download PDF
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperSubmittedAutomatic Defect Detection in Epitaxial Layers by Micro Photoluminescence ImagingJ. Frascaroli, I. Mica, M. Tonini, S. Colombo, L. Livellara, R. Fumagalli, V. Samu, M. Nagy, G. Molnár, Á. Horváth, Z. Bartal, Z. Kiss, T. Sipőcz2022Available upon request
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedTXRF/GIRXF high precision laboratory setup with high flux monochromatic sources for archeometric applicationsClaudia G. Fatuzzo (CNR), Philipp Hönicke (PTB), Claudia Caliri (CNR), Andreas Karydas (NCSR) and Francesco Paolo Romano (CNR)2021Download PDF
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedMultiscale simulations of plasma etching in silicon carbide structuresMarkus Italia (CNR), Ioannis Deretzis (CNR), Silvia Scalese (CNR), A.La Magna (CNR), M.Pirnaci (ST-I), D.Pagano (ST-I), Dario Tenaglia (ST-I), P.Vasquez (ST-I)Download PDF
ST-IWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationPublishedStructural and electrical characterization of Ni-based ohmic contacts on 4H-SiC formed by solid-state laser annealingPaolo Badalà (ST-I), Emanuele Smecca (CNR), Simone Rascunà (ST-I), Corrado Bongiorno (CNR), Egidio Carria (ST-I), Anna Bassi (ST-I), Gabriele Bellocchi (ST-I), Cristina Tringali (ST-I), Antonino La Magna (CNR) and Alessandra Alberti (CNR)Download PDF
CNRWP5 - Industry 4.0 digitization of manufacturing for enhanced productivityConference presentationSubmittedTXRF/GIRXF high precision laboratory setup with high flux monochromatic sourcesClaudia G. Fatuzzo (CNR), Philipp Hönicke (PTB), Claudia Caliri (CNR), Roberta Ricciari (ST-I), Daniele Pagano (ST-I), Andreas G. Karydas (CNR), Francesco Paolo Romano (CNR)2022Download PDF
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedA hybrid feature selection approach for virtual metrology: Application to CMP processT.KorabiI,V.Borodin, M. Juge, A.Roussy2021ASMC 2021 IEEE - Available upon request
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedOn feature selection for virtual metrologyO.Djedidi,V.Borodin, M. Juge, A.Roussy2021IEEE CASE 2021 - Available upon request
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedVirtual metrology for semiconductor manufacturing: Focus on transfer learningR.Clain,V.Borodin, M. Juge, A.Roussy2021APCM 2021 - Available upon request
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedVirtual Metrology: a state of the art reviewR.Clain,V.Borodin, M. Juge, A.Roussy2021IEEE CASE 2021 - Available upon request
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationSubmittedFeature Selection for Virtual Metrology Modeling:An application to Chemical Mechanical PolishingO.Djedidi, R.Clain, V.Borodin, A.Roussy2022ASMC 2022 - Available upon request
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationSubmittedOn Updating a Virtual Metrology Model in Semiconductor Manufacturing via Transfer LearningR.Clain, I. Azzizi, V.Borodin, A.Roussy2022ASMC 2022 - Available upon request
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationSubmittedDistance analysis in support of transfer Learning for Virtual MetrolgyR.Clain, V.Borodin, A.Roussy2022ENBIS 2022 - Available upon request
IMTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityPeer-reviewed paperSubmittedAn Interpretable Unsupervised Bayesian Network Model for Fault Detection and DiagnosisWT.Yang, M.Reis, V.Borodin, A.Roussy2022Available upon request
Nearfield InstrumentsWP3 - Metrology platforms developments for enhanced productivityConference presentationSubmittedHigh Throughput Scanning Probe Metrology for High-NA EUV photoresist profilingA. Khachaturiants et al2022Visit
PTBWP3 - Metrology platforms developments for enhanced productivityPeer-reviewed paperPublishedAnalysis of Line-Edge Roughness Using EUV ScatterometryA. Fernandez Herrero, F. Scholze, G. Dai, V. Soltwisch2022Visit
MENTWP4 - Industry 4.0 predictive yield and tools performance pilot line for enhanced productivityConference presentationPublishedML based optimization for high precision wafer dicing processMohamed Bahnas, Srividya Jayaram, Andres Torres, Siemens Digital Industries Software, Dimitrios Velenis, Julien Bertheau, IMEC, Moritz Stoerring, Bruno Van de Vel, Maarten Liebens, KLA2022Download PDF
V2C2WP5 - Industry 4.0 digitization of manufacturing for enhanced productivityPeer-reviewed paperSubmittedCui bono Smart Factory? A critical review of realised benefits and insights for future researchManfred Rosenberger2022To be published